Optical far-field method with subwavelength accuracy for the determination of nanostructure dimensions in large-area samples

Nicklas Anttu*, Magnus Heurlin, Magnus T. Borgström, Mats Erik Pistol, H. Q. Xu, Lars Samuelson

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Abstract

The physical, chemical, and biological properties of nanostructures depend strongly on their geometrical dimensions. Here we present a fast, noninvasive, simple-to-perform, purely optical method that is capable of characterizing nanostructure dimensions over large areas with an accuracy comparable to that of scanning electron microscopy. This far-field method is based on the analysis of unique fingerprints in experimentally measured reflectance spectra using full three-dimensional optical modeling. We demonstrate the strength of our method on large-area (millimeter-sized) arrays of vertical InP nanowires, for which we simultaneously determine the diameter and length as well as cross-sample morphological variations thereof. Explicitly, the diameter is determined with an accuracy better than 10 nm and the length with an accuracy better than 30 nm. The method is versatile and robust, and we believe that it will provide a powerful and standardized measurement technique for large-area nanostructure arrays suitable for both research and industrial applications.

Original languageEnglish
Pages (from-to)2662-2667
Number of pages6
JournalNano Letters
Volume13
Issue number6
DOIs
Publication statusPublished - 12 Jun 2013
MoE publication typeA1 Journal article-refereed

Keywords

  • indium phosphide
  • nanostructure
  • nanowire array
  • Optical metrology
  • semiconductor
  • spectroscopy

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