Fabrication of nanoperforated ultrathin TiO2 films by inkjet printing

Xu Qian, Jan-Henrik Smått, Jouko Peltonen, Petri Ihalainen

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)


Fabrication of nanoperforated TiO2 thin films (NP-TiO2) on various substrates utilizing evaporation-induced self-assembly has been widely reported during recent years. For many applications, such as solar cells and gas sensors, it would be beneficial if the active material could be deposited onto a desired area or in the form of a pattern or array. In this study, inkjet printing was successfully used to produce NP-TiO2 at both ambient temperature and 60 degrees C. Especially for intermediate drop spacings (40 and 50 mu m), millimeter-sized homogeneous NP-TiO2 patches were obtained with similar NP structure as those being processed by dip coating and drop casting. Compared to ambient temperature, inkjet printing at 60 degrees C provides a narrower height distribution of the NP structures of about 5 nm. Compared to dip coating and drop casting, inkjet printing enables the deposition of the ink onto target areas, thus enabling the fabrication of microscale arrays and other patterned structures.
Original languageUndefined/Unknown
Pages (from-to)2144–2150
JournalJournal of Materials Research
Issue number14
Publication statusPublished - 2015
MoE publication typeA1 Journal article-refereed


  • Inkjet printing
  • TiO2

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