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Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films
Changyong Oh, Amit Tewari, Kyungkwan Kim, Ulayil Sajesh Kumar, Changhwan Shin, Minho Ahn, Sanghun Jeon
Research output: Contribution to journal › Article › Scientific › peer-review
9
Citations
(Scopus)