Fabrication of nanoperforated ultrathin TiO2 films by inkjet printing

A1 Journal article (refereed)


Internal Authors/Editors


Publication Details

List of Authors: Qian Xu, Jan-Henrik Smått, Jouko Peltonen, Petri Ihalainen
Publisher: CAMBRIDGE UNIV PRESS
Publication year: 2015
Journal: Journal of Materials Research
Volume number: 30
Issue number: 14
Start page: 2144
End page: 2150
ISSN: 0884-2914


Abstract

Fabrication of nanoperforated TiO2 thin films (NP-TiO2) on various substrates utilizing evaporation-induced self-assembly has been widely reported during recent years. For many applications, such as solar cells and gas sensors, it would be beneficial if the active material could be deposited onto a desired area or in the form of a pattern or array. In this study, inkjet printing was successfully used to produce NP-TiO2 at both ambient temperature and 60 degrees C. Especially for intermediate drop spacings (40 and 50 mu m), millimeter-sized homogeneous NP-TiO2 patches were obtained with similar NP structure as those being processed by dip coating and drop casting. Compared to ambient temperature, inkjet printing at 60 degrees C provides a narrower height distribution of the NP structures of about 5 nm. Compared to dip coating and drop casting, inkjet printing enables the deposition of the ink onto target areas, thus enabling the fabrication of microscale arrays and other patterned structures.


Keywords

Inkjet printing, TiO2

Last updated on 2019-19-11 at 04:37